美國薩凡納藝術與設計學院服裝留學要求
2024-03-30 15:04:05 來源：中國教育在線
很多同學都很關注美國薩凡納藝術與設計學院服裝留學要求這個問題，那么接下來就跟著中國教育在線小編一起來看看吧，相信你通過以下的文章內容就會有更深入的了解。
一、院校介紹
SCAD是全美最大的藝術學院，也是全球最大的專門藝術大學之一。位于佐治亞州有著200多年的歷史古城薩凡納市。由于整個城市的古建筑保存完好，這里被人們稱為美國最美麗的城市之一。學院建筑系的教學樓是一座建于1887年的古屋，而整個城市更像是一座活生生的建筑博物館，有著百年歷史的建筑隨處可見，現在仍舊有人居住和使用。
院校排名：薩凡納藝術與設計學院在2019QS世界大學專業(yè)排名(藝術設計)中，名列世界第47，美國第16。
School of Design設計學院：
設計學院下面設有以下幾個系：可持續(xù)設計(Design for sustainability)MA，設計管理(Design management)MA、MFA，纖維(Fibers)，工業(yè)設計(Industrial design)BFA / MA、MFA，珠寶設計系(Jewelry and objects)BFA / MA、MFA，服務設計(Service design)BFA / MFA。這些專業(yè)都是在薩凡納校區(qū)上課。
二、服裝設計申請要求
申請專業(yè)
M.F.A. in fashion 90學時
作品集要求
Fashion Portfolios should demonstrate a thorough understanding of the design process through mood boards, fashion illustrations, flats and sewn garments from two-three collections. Applicants should show competency in the use of various industrial machinery and sewing techniques, and should submit 2D documentation of full-scale patterns, drapes and original sewn garments. The portfolio should demonstrate a high level of technical and conceptual ability, as well as creative research, investigation, problem-solving and an awareness of material processes. Applicants also should demonstrate a well-developed personal and aesthetic/design direction in the ability to develop work around a theme or concept as evidenced by a series of related works.
托福/雅思要求：
SCADs TOEFL institution code is 5631.
申請專業(yè)
M.A. in fashion 45學時
作品集要求
Fashion Portfolios should demonstrate a thorough understanding of the design process through mood boards, fashion illustrations, flats and sewn garments from two-three collections. Applicants should show competency in the use of various industrial machinery and sewing techniques, and should submit 2D documentation of full-scale patterns, drapes and original sewn garments. The portfolio should demonstrate a high level of technical and conceptual ability, as well as creative research, investigation, problem-solving and an awareness of material processes. Applicants also should demonstrate a well-developed personal and aesthetic/design direction in the ability to develop work around a theme or concept as evidenced by a series of related works.
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